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Helios-PL PL System

 

 

Photoluminescence (PL) Imaging is a unique non-invasive inspection tool as it can be used in-line at many different steps of the cell manufacturing process. This facilitates the direct comparison of data obtained at one process step to data obtained at another. Additionally, PL imaging can be compared to electroluminescence (EL) imaging on finished cells using comparable equipment.




Product's Feature
Application:
Mono crystal silicon wafers and cells,
Poly crystal silicon wafers and cells
Thin film cells
Compounds cells
Capabilities:
Minority carrier lifetime scan
Silicon classification
Series resistance
Micro cracked
IV curve in dark and light conditions
In-Line PL Imaging Benefits
  Screen every wafer at in-line speeds 
  Obtain information across entire wafer - not just at discrete points
  Identify Anomalous Cause Variations
  Identify and Track Defect Mitigation
Define and Identify
  Responsible for low lowering yield and degrading efficiency 
  Characterize wafers from processes steps.
Measure and Analyze 
  Obtain photoluminescence PL imagery of processing steps 
  Track wafers through all processing steps 
  Collate information for use in predictive model
  Tailored in-line design
Improve and Control 
  Integrate in-line equipment into production line 
  Continuous improvement monitoring processes 
Used for electroluminescence imaging on finished cells
Only process good material
Cost effectively improve throughput
Maximize average cell efficiencies
Tighten cell efficiency distribution
Identify common and special cause variations in real-time  
We provide more than inspection equipment.




技術參數(shù):

Indium gallium arsenide sensor :900-1500nm
Size: 23mm * 23mm ~ 200mm * 200mm
Pixels: 752 × 480pixel
Testing time<1s



 

Typical Customer:
American,Europe and Asia and so on.